JEOL JSM-7600F Scanning electron microscope
Features: Semi-in-lens provides high-resolution observation and analysis: High resolution observation and high spatial resolution analysis is achieved through the combination of a semi-in-lens type objective lens that can collimate the electron beam even at low accelerating voltages, and the in-lens Schottky electron source that provides a stable current over a long service life. Gentle Beam (GB) provides top-surface imaging with ultra-low energy incident electrons: A Gentle Beam (GB mode) with better resolution than the normal mode is available. In GB mode a bias voltage is applied to the specimen while the electron beam is emitted, allowing top-surface imaging with only several hundred eV of incident electron, making it possible to obtain high resolution images of samples that have been difficult to observe until now. High Power Optics delivers high-speed, high-precision analysis: High Power Optics are adopted for the optical system, providing not only high-resolution imaging, but also stably delivering high-speed, high-precision analysis, including element analysis.
Specifications: EI resolution: 1.0nm (15kV), 1.5nm (1kV) Magnification: 25 to 1,000,000x (on the image size 120mm 90mm) Accelerating voltage: 0.1kV to 30kV Probe current: 1pA to 200nA Aperture angle control lens: Built-in Detectors: Upper detector, lower detector Energy filter: New r-filter Gentle Beam: Built-in Digital image: 1,280 x 960 pixels, 2,560 x 1,920 pixels, 5,120 x 3,840 pixels Specimen airlock chamber: One-action specimen exchange mechanism built-in Specimen stage: Eucentric, 5 axes motor control Type: IA (X-Y: 70mm x 50mm), II (X-Y: 110mm x 80mm), III (X-Y: 140mm x 80mm) Tilt: -5° to ~+70° Rotation: 360° WD: 1.5mm to 25mm Evacuation system: Two SIPs, TMP, RP Eco design: During normal operation: 1.2kVA; During the sleepmode: 1kVA; During the evacuation system OFF: 0.76kVA Haskris chiller included Cancellation cage (metal cage around the chamber) is NOT included with the sale. Buyer is responsible for the removal of the instrument from the facility. Working with JEOL is recommended to avoid damages during disassembly.
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